Mask Aligner
Mask Aligner
Mask Aligner
Description
The Mask aligner is for UV lithography, a microfabrication process to selectively remove parts of a thin film of photoresist on a substrate. It uses UV light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. Sub-micron size features can be created after a series of chemical developments and thermal treatment. Our SUSS MJB3 has a mercury lamp providing NUV spectrum ranging from 350 nm to 450 nm and can handle 2” wafers such as Si, GaAs semiconductor as well as other flat substrate.
Details
| Manufacturer | |
|---|---|
| Model No. | MJB 3 |
| Serial No. | 1478 |
| Location | NanoTechnology Photolithography Lab (Cle [1-086-0028-00MB-B64A] |
| Identifier | 10077882 |
| Organisation: | School of Electronic & Electrical Eng [50000070] |
| Owner |
Edmund Linfield
e.h.linfield@leeds.ac.uk 0113-34-32015 |
| Contact | |
| Category / Taxonomy | Process Equipment - Physical > Lithography > Optical (Lithography) (Genus) |