AS-one Furnace
AS-one Furnace
AS-one Furnace
Description
Rapid thermal annealer provides heat treatment to semiconductor wafers to high temperatures (up to 1,000°C or greater) in a short time of seconds or minutes before cooling down. The thermal processes are used for a variety of applications such as dopant activation, metal diffusion. An example, AS - one Furnace can ramp up to 420°C from room temperature in 1.5 minutes.
Details
| Manufacturer | AS-ONE |
|---|---|
| Model No. | AS-ONE 100 |
| Serial No. | AS0210R4-5065 |
| Location | NanoTechnology Laboratory No.2 [1-086-0028-00GR-G64] |
| Identifier | 10058744 |
| Organisation: | School of Electronic & Electrical Eng [50000070] |
| Owner |
Edmund Linfield
e.h.linfield@leeds.ac.uk 0113-34-32015 |
| Contact | |
| Category / Taxonomy | Process Equipment - Physical > Controlled Environment > Rapid Thermal Annealer |